• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    A vacuum exhaust system can improve the operating efficiency of the vacuum exhaust system while reducing the system cost, to quickly attain a vacuum in the auxiliary chambers without increasing the size of the vacuum pumps. The vacuum exhaust system comprises a first pumping section and a second pumping section disposed downstream of and in series with the first pumping section. A main exhaust passage is provided to communicate a main chamber with a suction port of the first pumping section, and an auxiliary exhaust passage is provided to communicate an auxiliary chamber with a suction port of the second pumping section.
    公开号:US20010001950A1
    申请号:US09/252,236
    申请日:1999-02-18
    公开日:2001-05-31
    发明作者:Takeshi Kawamura；Yasuhiro Niimura
    申请人:Ebara Corp；GTE Service Corp；
    IPC主号:C23C16-54
    专利说明:
    [0001] 1. Field of the Invention [0001]
    [0002] The present invention relates to a vacuum exhaust system for use in evacuating a processing chamber for advanced products such as semiconductor devices, for example. [0002]
    [0003] 2. Description of the Related Art [0003]
    [0004] A conventional arrangement of a vacuum exhaust system used in semiconductor device manufacturing processes to evacuate a processing chamber for carrying out such process as etching and chemical vapor deposition (CVD) of semiconductor wafers is shown in FIG. 8. A main chamber (processing chamber) [0004] 10 is connected on both sides to auxiliary chambers (load lock chambers) 12 a, 12 b, for loading and unloading purposes through respective gates 14. Each auxiliary chamber 12 a, 12 b is isolated from or open to the external environment by a gate 15.
    [0005] The main chamber [0005] 10 is connected to a vacuum pump 18 through an exhaust path 16 having a valve 20, and each auxiliary chamber 12 a, 12 b is connected similarly to a vacuum pump 24 through an exhaust path 22 having a valve 26. It has been customary to use rotary oil pumps for the vacuum pumps 18, 24, but lately, dry pumps are used primarily for this type of work.
    [0006] In this type of apparatus, in order to access the main chamber [0006] 10 while it is under vacuum, loading or unloading of a workpiece into the main chamber 10 requires that an auxiliary chamber 12 be evacuated first, and the gate 14 opened next so as to avoid exposing the main chamber 10 to external atmosphere. This is done to prevent the main chamber 10 and associated piping from contamination as well as to improve productivity by shortening the time for re-starting.
    [0007] In such conventional systems, a vacuum pump is provided for each chamber to evacuate individual chambers, therefore, working efficiency of each vacuum pumps is low. If the number of main chambers [0007] 10 is increased in an effort to raise productivity, it leads to a problem that the number of vacuum pumps need to be increased, leading ultimately to a large size facility and higher running costs. If an attempt is made to shorten the time for evacuating the auxiliary chambers, a higher capacity for each pump is required, thus aggravating the above problems even further. SUMMARY OF THE INVENTION
    [0008] It is an object of the present invention to provide a vacuum exhaust system to enable as much sharing of vacuum pumps as possible, to improve the operating efficiency of the vacuum exhaust system while reducing the system cost, or to quickly attain a vacuum in the auxiliary chambers without increasing the size of the vacuum pumps. [0008]
    [0009] The object has been achieved in a vacuum exhaust system for evacuating a main chamber and at least one associated auxiliary chamber comprising: a first pumping section; a second pumping section disposed downstream of and in series with the first pumping section; a main exhaust passage communicating the main chamber with a suction port of the first pumping section; at least one auxiliary exhaust passage communicating the auxiliary chamber with a suction port of the second pumping section. [0009]
    [0010] Accordingly, the main chamber can be evacuated with two pumping sections arranged in series, and the auxiliary chambers are evacuated with one of the pumping sections, thereby increasing the operating efficiency of each pumping section while keeping the capacity of each pump as small as practicable. [0010]
    [0011] The first and second pumping sections may share a common drive motor. Accordingly, one multi-stage vacuum pump can manage the task of evacuating an entire processing system so that the number of vacuum pumps can be reduced compared with a case of providing a vacuum pump for each auxiliary chamber. However, the first pumping section and the second pumping section may be provided with individual drive sections. [0011]
    [0012] The pumping sections may be controlled so as to obtain a minimum fluctuation in pressure, according to a pressure measured inside the main chamber. Accordingly, pressure changes can be held to a minimum in the main chamber which is an important chamber for processing advanced products such as semiconductor devices. [0012]
    [0013] Another aspect of the invention is a vacuum exhaust system for evacuating a main chamber and a plurality of associated auxiliary chambers, the plurality of auxiliary chambers having a connecting passage connecting each other which can be opened or closed to equalize pressure in the auxiliary chambers. Accordingly, vacuum environment present inside an auxiliary chambers can be utilized to lower the pressure of another auxiliary chamber which may be at an atmospheric pressure so that evacuation time can be significantly reduced to improve the operating efficiency of the overall evacuation operation. [0013] BRIEF DESCRIPTION OF THE DRAWINGS
    [0014] FIG. 1 is a schematic diagram of a first embodiment of the vacuum exhaust system of the present invention; [0014]
    [0015] FIG. 2 is a time-chart showing the control steps for the first system shown in FIG. 1; [0015]
    [0016] FIG. 3 is a schematic diagram of a variation of the first system; [0016]
    [0017] FIG. 4 is a schematic diagram of another embodiment of the vacuum exhaust system of the present invention; [0017]
    [0018] FIG. 5 is a time-chart showing the control steps for the second system shown in FIG. 4; [0018]
    [0019] FIG. 6 is a variation of the second system; [0019]
    [0020] FIG. 7 is a schematic diagram of a third embodiment of the vacuum exhaust system of the present invention; and [0020]
    [0021] FIG. 8 is a schematic diagram of a conventional vacuum exhaust system. [0021] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
    [0022] Preferred embodiments will be presented in the following with reference to the drawings. [0022]
    [0023] FIGS. 1 and 2 relate to a first embodiment of the vacuum exhaust system of the present invention, which includes, as in the conventional systems, a main chamber [0023] 10 for carrying out processes such as etching and CVD of semiconductor wafers. An auxiliary chamber 12 a is attached, through a gate 14 a, to the main chamber 10 on the loading-side, and an auxiliary chamber 12 b is attached, through a gate 14 b, to the main chamber 10 on the unloading-side. Each of the auxiliary chambers 12 a, 12 b is isolated from and connected to the outside atmosphere through respective gates 15 a, 15 b.
    [0024] To exhaust three chambers [0024] 10, 12 a, 12 b, one two-stage pump 34 is used. The two-stage pump 34 has a first pumping section 30 a on the upstream side, and a second pumping section 30 b on the downstream side. The pumping sections 30 a, 30 b share a common shaft connected to a variable-speed motor 32. The two-stage pump 34 is provided with a suction port 34 a, and an exhaust port 34 b, and an intermediate port 34 c opening at a location between the pumping section 30 a, 30 b. The exhaust passage 16 for the main chamber 10 is connected through a valve 20 to the suction port 34 a, and the exhaust passages 22 a, 22 b, respectively, for auxiliary chambers 12 a, 12 b, are connected though respective valves 26 a, 26 b to the intermediate port 34 c.
    [0025] As shown in FIG. 2, performance of the two-stage pump [0025] 34 is designed so as to enable exhaustion of the main chamber 10 at a first rotation speed n1, and to enable exhaustion of the main chamber 10 and one of the auxiliary chamber 12 a, 12 b concurrently at a second rotation speed n2 which is larger than n1. This exhaustion system is provided with a control section 38 to control the operating parameters such as on/off and rotational speed for the variable speed motor 32 according to output signal from a pressure sensor 36 provided inside the main chamber 10. Speed control can be effected by following a certain pre-selected pattern in sequence or by feedback control to follow signals output from the sensor 36.
    [0026] Operation of the vacuum exhaust system in first embodiment will be explained with reference to FIG. 2 showing the time-sequence of a processing workpiece. First, the gate [0026] 15 a is opened to load the workpiece into the auxiliary chamber 12 a, and the gate 15 a is closed. Next, valves 26 a, 20 are opened and the pump 34 is operated at the higher second speed n2, and the rotation speed is gradually reduced back to the first speed n1 during a time interval (t1-t2) so that the auxiliary chamber 12 a and the main chamber 10 are both evacuated. After the main chamber 10 reaches a required pressure, workpiece processing operation can be started.
    [0027] While the processing is proceeding in the main chamber [0027] 10, the auxiliary chamber 12 b will also be evacuated. The pump 34 is operated at the higher second speed n2 and the rotation speed is gradually reduced back to the first speed n1 during a time interval (t2-t3). After the auxiliary chamber 12 b is exhausted, the pump 34 is operated at the first speed n1 to complete the processing in the main chamber 10 during a time interval (t3-t4).
    [0028] Next, the gate [0028] 14 b is opened to unload the processed workpiece from the main chamber 10 to the auxiliary chamber 12 b at time t4. During the processing interval in the main chamber 10, a new workpiece is placed inside the auxiliary chamber 12 b by opening the gate 15 a, so that the interior pressure is at an atmospheric pressure. At this point, the steps from time t1 are repeated. In the meantime, the gate 15 b is opened to remove the processed workpiece from inside the auxiliary chamber 12 b.
    [0029] By following the steps described above, the embodied exhaustion system enables to operate the system with one pump by suitably switching the evacuation process among the main chamber and the auxiliary chambers thereby reliably maintaining the required load locking functions. And since the emphasis is placed on exhausting the main chamber by using a multi-stage pump, lowering of gas exhausting capability of the main chamber is avoided. [0029]
    [0030] In the above case, although the rotation speed was controlled sequentially according to a pre-determined pattern, it is permissible to use a feedback control according to signals output from a pressure sensor [0030] 36. When valves 26 a, 20 are opened to evacuate the auxiliary chamber 12 a and the main chamber 10, opening of the valve 26 a causes the pressure in the mid-chamber 35 of the pump 34 to increase, and the pump capacity is lowered so that the interior pressure in the main chamber 10 is also increased. To avoid such critical pressure fluctuation in the main chamber 10, the interior pressure can be monitored by a pressure sensor 36 so as to control the rotation-speed of the pump 34 at a speed between the second speed n2 and the first speed n1.
    [0031] FIG. 3 shows a variation of the first embodiment, which uses two individual pumps connected in series. A first stage booster pump [0031] 42 is connected in series with a second stage main pump 46. Each pump is driven by separate variable speed motors 40, 44, whose speeds can be controlled separately by a control section 38.
    [0032] The exhaust passage [0032] 16 of the main chamber 10 is connected through a valve 20 to a suction port 42 a of the booster pump 42, and the exhaust port of booster pump 42 and the suction port of main pump 46 are connected through a connecting pipe 50 having an intermediate port 52. The exhaust passages 22 a, 22 b of the auxiliary chambers 12 a, 12 b are connected through the valves 26 a, 26 b to the intermediate port 52. Operational characteristics of this embodiment system are the same as those in the first case, and their explanations will be omitted.
    [0033] In this example also, the rotation speed of the pump can be feedback controlled using the output signals from a pressure sensor [0033] 36. In this example, rotation speed of main pump 46 and booster pump 42 can be controlled independently to enable more precise control of the pressure.
    [0034] FIG. 4 is a schematic diagram of another embodiment of the vacuum exhaust system. This system includes: a connecting passage [0034] 60 to connect both auxiliary chambers 12 a, 12 b shown in FIG. 1 to equalize the vacuum pressure; and a valve 62 for opening or closing the connecting passage 60. The valve 62 is controlled by a control section 38 to open in advance when either the auxiliary chamber 12 a or 12 b is exhausted.
    [0035] The embodied vacuum exhaust system is used, for example, when exhausting the auxiliary chamber [0035] 12 a after it has been loaded with a workpiece so that it is at an atmospheric pressure, in a way that the valve 62 is opened before the valve 26 a is opened to evacuate with the multi-stage pump 34 (at time t5). At this time, the auxiliary chamber 12 b has a processed workpiece passed from the main chamber so that its interior pressure is maintained at some low pressure. Therefore, by opening the valve 62, air flows from the auxiliary chamber 12 a to auxiliary chamber 12 b so that both chambers attain a common pressure intermediate between an atmospheric pressure and vacuum.
    [0036] After this stage, valve [0036] 62 is closed, and as in FIG. 1, pump 34 is operated at a higher second speed n2 (at time t6) to exhaust both auxiliary chamber 12 a and main chamber 10. In this case, because the initial pressure in the auxiliary chamber is less than an atmospheric pressure, the length of time required to exhaust the auxiliary chamber is reduced compared with the system shown in FIG. 1. In the auxiliary chamber 12 b, gate 15 b is opened and the processed workpiece is withdrawn. This system thus allows to utilize the reduced-pressure environment of the auxiliary chamber 12 b, which is normally discarded to waste, to shorten the evacuation time of the auxiliary chamber 12 a. This feature further contributes to increasing the operating efficiency of the overall vacuum exhaust system.
    [0037] Similarly, when exhausting the auxiliary chamber [0037] 12 b, valve 62 is first opened temporarily (time t7) to introduce the vacuum environment in the auxiliary chamber 12 a before an unprocessed workpiece has been loaded into the auxiliary chamber 12 b (time t7-t8) so that auxiliary chamber 12 b can be reduced in pressure, and then the multi-stage pump 34 is operated at a fast speed. Thus, the exhaustion time for the auxiliary chamber 12 b can be shortened.
    [0038] FIG. 6 shows a variation of the system shown in FIG. 4. This system is based on the variation based on the third embodiment shown in FIG. 3, and includes a connecting path [0038] 60 and a valve 62 which is designed to be opened before evacuating either of the auxiliary chamber 12 a or 12 b.
    [0039] FIG. 7 shows a third embodiment, and includes auxiliary chambers [0039] 12 a, 12 b having dedicated exhaust passages 22 a, 22 b, provided with respective vacuum pump 24 a, 24 b respectively, connected with connecting passage 60, and within the connecting passage 60, a valve 62 which is designed to open prior to evacuating either auxiliary chamber 12 a or 12 b. This system also enables to utilize waste vacuum, as in the systems shown in FIGS. 3 and 6, to shorten the exhaustion time required to evacuate the auxiliary chambers 12 a, 12 b.
    权利要求:
    Claims (16)
    [1" id="US-20010001950-A1-CLM-00001] 1. A vacuum exhaust system for evacuating a main chamber and at least one associated auxiliary chamber comprising:
    a first pumping section;
    a second pumping section disposed downstream of and in series with said first pumping section;
    a main exhaust passage communicating said main chamber with a suction port of said first pumping section; and
    at least one auxiliary exhaust passage communicating said auxiliary chamber with a suction port of said second pumping section.
    [2" id="US-20010001950-A1-CLM-00002] 2. A vacuum exhaust system according to
    claim 1 , wherein said at least one auxiliary exhaust passage comprises a shut-off valve.
    [3" id="US-20010001950-A1-CLM-00003] 3. A vacuum exhaust system according to
    claim 1 , wherein said first pumping section and said second pumping section share a common drive motor to constitute a multi-stage vacuum pump.
    [4" id="US-20010001950-A1-CLM-00004] 4. A vacuum exhaust system according to
    claim 1 , wherein said first pumping section and said second pumping section are individually provided with respective drive sections.
    [5" id="US-20010001950-A1-CLM-00005] 5. A vacuum exhaust system according to
    claim 1 , further comprising a control section for controlling rotation speed of said first or second pumping sections so as to obtain a minimum fluctuation in pressure, according to a pressure measured inside said main chamber.
    [6" id="US-20010001950-A1-CLM-00006] 6. A vacuum exhaust system according to
    claim 1 , wherein said a plurality of said auxiliary chambers are provided to said main chamber.
    [7" id="US-20010001950-A1-CLM-00007] 7. A vacuum exhaust system according to
    claim 1 , wherein said auxiliary chamber is a load lock chamber.
    [8" id="US-20010001950-A1-CLM-00008] 8. A vacuum exhaust system for evacuating a main chamber and a plurality of associated auxiliary chambers, said plurality of auxiliary chambers having a connecting passage connecting each other which can be opened or closed to equalize pressure in said auxiliary chambers.
    [9" id="US-20010001950-A1-CLM-00009] 9. A vacuum exhaust system according to
    claim 8 , wherein said auxiliary chambers comprise at least one load lock chamber.
    [10" id="US-20010001950-A1-CLM-00010] 10. A vacuum exhaust system according to
    claim 8 , further comprising a control section for controlling said connecting passage to open and close before one of said auxiliary chambers are evacuated.
    [11" id="US-20010001950-A1-CLM-00011] 11. A method for exhausting a main chamber and at least one associated auxiliary chamber comprising:
    disposing a second pumping section downstream of and in series with a first pumping section;
    communicating said main chamber with a suction port of said first pumping section through a main exhaust passage;
    communicating said at least one auxiliary chamber with a suction port of said second pumping section through an auxiliary exhaust passage; and
    opening said auxiliary exhaust passage so as to apply evacuation ability of said second pumping section to evacuation of said auxiliary chamber.
    [12" id="US-20010001950-A1-CLM-00012] 12. A method according to
    claim 11 , wherein said first pumping section and said second pumping section share a common drive motor to constitute a multi-stage vacuum pump.
    [13" id="US-20010001950-A1-CLM-00013] 13. A method according to
    claim 11 , wherein said first pumping section and said second pumping section are individually provided with respective drive sections.
    [14" id="US-20010001950-A1-CLM-00014] 14. A method according to
    claim 11 , further comprising controlling rotation speed of said first or second pumping sections so as to obtain a minimum fluctuation in pressure, according to a pressure measured inside said main chamber.
    [15" id="US-20010001950-A1-CLM-00015] 15. A method according to
    claim 11 , wherein said a plurality of said auxiliary chambers are provided to said main chamber.
    [16" id="US-20010001950-A1-CLM-00016] 16. A method according to
    claim 11 , wherein said auxiliary chamber is a load lock chamber.
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    US6251192B1|2001-06-26|
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    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    EP1668254A2|2003-09-30|2006-06-14|The BOC Group plc|Vacuum pump|
    WO2008017880A1|2006-08-08|2008-02-14|Edwards Limited|Apparatus for conveying a waste stream|
    WO2010094801A1|2009-02-22|2010-08-26|Mapper Lithography Ip B.V.|A method and arrangement for realizing a vacuum in a vacuum chamber|
    US20120004011A1|2010-07-01|2012-01-05|Qualcomm Incorporated|Parallel Use of Integrated Non-Volatile Memory and Main Volatile Memory within a Mobile Device|
    EP3067560A1|2015-03-12|2016-09-14|Pfeiffer Vacuum GmbH|Vacuum pump and method for operating a scroll pump or a vacuum pump with at least two pump stages|
    CN110408913A|2019-08-26|2019-11-05|湖南红太阳光电科技有限公司|The pressure control device of Tubular PECVD device|US4725204A|1986-11-05|1988-02-16|Pennwalt Corporation|Vacuum manifold pumping system|
    KR950007378B1|1990-04-06|1995-07-10|가부시끼 가이샤 히다찌 세이사꾸쇼|Vacuum pump|
    JP3200668B2|1991-08-09|2001-08-20|東京エレクトロン株式会社|Exhaust method in cryopump and micromachining equipment|
    NL9200076A|1992-01-16|1993-08-16|Leybold B V|METHOD, DRY MULTI-STAGE PUMP AND PLASMA SCRUBBER FOR CONFORMING REACTIVE GASES.|
    JPH05218176A|1992-02-07|1993-08-27|Tokyo Electron Tohoku Kk|Heat treatment and transfer of article to be treated|
    US6047713A|1994-02-03|2000-04-11|Applied Materials, Inc.|Method for cleaning a throttle valve|
    US5443644A|1994-03-15|1995-08-22|Kashiyama Industry Co., Ltd.|Gas exhaust system and pump cleaning system for a semiconductor manufacturing apparatus|
    US5685963A|1994-10-31|1997-11-11|Saes Pure Gas, Inc.|In situ getter pump system and method|
    US5558717A|1994-11-30|1996-09-24|Applied Materials|CVD Processing chamber|
    JP3270852B2|1995-04-20|2002-04-02|東京エレクトロン株式会社|Pressure adjusting device and room communication method using the same|
    US5556473A|1995-10-27|1996-09-17|Specialty Coating Systems, Inc.|Parylene deposition apparatus including dry vacuum pump system and downstream cold trap|
    KR0183912B1|1996-08-08|1999-05-01|김광호|Pumping facility connected to the multi-reaction chamber and method thereof|
    US5902088A|1996-11-18|1999-05-11|Applied Materials, Inc.|Single loadlock chamber with wafer cooling function|
    US5855681A|1996-11-18|1999-01-05|Applied Materials, Inc.|Ultra high throughput wafer vacuum processing system|US7077159B1|1998-12-23|2006-07-18|Applied Materials, Inc.|Processing apparatus having integrated pumping system|
    US7001640B2|2000-05-31|2006-02-21|Canon Kabushiki Kaisha|Apparatus and method for forming deposited film|
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    JP4821074B2|2001-08-31|2011-11-24|東京エレクトロン株式会社|Processing system|
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    US7585141B2|2005-02-01|2009-09-08|Varian Semiconductor Equipment Associates, Inc.|Load lock system for ion beam processing|
    US8082741B2|2007-05-15|2011-12-27|Brooks Automation, Inc.|Integral facet cryopump, water vapor pump, or high vacuum pump|
    US20090242046A1|2008-03-31|2009-10-01|Benjamin Riordon|Valve module|
    CN107164742B|2011-03-01|2020-10-16|应用材料公司|Vacuum chamber with shared pump|
    US20130017317A1|2011-07-13|2013-01-17|Ring Kenneth M|Load lock control method and apparatus|
    US9575494B2|2013-11-14|2017-02-21|Taiwan Semiconductor Manufacturing Co., Ltd.|Mechanisms for processing wafer|
    法律状态:
    1999-02-18| AS| Assignment|Owner name: EBARA CORPORATION, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:KAWAMURA TAKESHI;NIIMURA YASUHIRO;REEL/FRAME:009791/0500 Effective date: 19990209 |
    2000-04-10| AS| Assignment|Owner name: GTE SERVICE CORPORATION, TEXAS Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:GTE TELECOM INTERNATIONAL SYSTEMS CORPORATION;REEL/FRAME:010748/0927 Effective date: 20000330 |
    2004-12-14| FPAY| Fee payment|Year of fee payment: 4 |
    2009-01-05| REMI| Maintenance fee reminder mailed|
    2009-06-26| LAPS| Lapse for failure to pay maintenance fees|
    2009-07-27| STCH| Information on status: patent discontinuation|Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
    2009-08-18| FP| Lapsed due to failure to pay maintenance fee|Effective date: 20090626 |
    优先权:
    申请号 | 申请日 | 专利标题
    JP10052984A|JPH11230036A|1998-02-18|1998-02-18|Evacuating system|
    JP10-052984||1998-02-18||
    JP52984/1998||1998-02-18||
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